Nitrogen interstitial defects in silicon. A quantum mechanical investigation of the structural, electronic and vibrational properties
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Journal Articles
Materials Today Communications
Year : 2019
Fabien PASCALE : Connect in order to contact the contributor
https://hal.univ-lorraine.fr/hal-03424455
Submitted on : Thursday, February 8, 2024-10:39:39 AM
Last modification on : Thursday, April 11, 2024-1:08:15 PM
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Alexander Platonenko, Francesco Silvio Gentile, Jefferson Maul, Fabien Pascale, Eugene Kotomin, et al.. Nitrogen interstitial defects in silicon. A quantum mechanical investigation of the structural, electronic and vibrational properties. Materials Today Communications, 2019, 21, pp.100616. ⟨10.1016/j.mtcomm.2019.100616⟩. ⟨hal-03424455⟩
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