M. S. Ambacher, R. Brandt, T. Dimitrov, M. Metzger, R. A. Stutzmann et al., Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.14, issue.6, p.3532, 1996.
DOI : 10.1116/1.588793

D. Katnani and K. I. Papathomas, Kinetics and initial stages of oxidation of aluminum nitride: Thermogravimetric analysis and x???ray photoelectron spectroscopy study, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.5, issue.4, p.1335, 1987.
DOI : 10.1116/1.574765

-. Lin and F. Lu, Oxidation behavior of AlN films at high temperature under controlled atmosphere, Journal of the European Ceramic Society, vol.28, issue.3, p.691, 2008.
DOI : 10.1016/j.jeurceramsoc.2007.07.015

D. Patel and P. S. Nicholson, High frequency, high temperature ultrasonic transducers, NDT International, vol.23, issue.5, p.262, 1990.
DOI : 10.1016/0308-9126(90)92152-Q

URL : http://lib.dr.iastate.edu/cgi/viewcontent.cgi?article=1578&context=qnde

M. B. Elmazria, P. Assouar, P. Renard, and . Alnot, Electrical properties of piezoelectric aluminium nitride films deposited by reactive dc magnetron sputtering, physica status solidi (a), vol.196, issue.2, p.416, 2003.
DOI : 10.1002/pssa.200306446

M. B. Kirsch, O. Assouar, M. Elmazria, V. Hakiki, P. Mortet et al., Combination of e-Beam Lithography and of High Velocity AlN/Diamond-Layered Structure for SAW Filters in X Band, IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, vol.54, issue.7, p.1486, 2007.
DOI : 10.1109/TUFFC.2007.411

Q. A. Tammann and . Mansuri, Metallographische Mitteilungen aus dem Institut f??r physikalische Chemie der Universit??t G??ttingen CXIII. Zur Rekristallisation von Metallen und Salzen, Zeitschrift f??r anorganische und allgemeine Chemie, vol.122, issue.1, p.119, 1923.
DOI : 10.1002/zaac.19221220126

B. Ruckenstein and . Pulvermacher, Growth kinetics and the size distributions of supported metal crystallites, Journal of Catalysis, vol.29, issue.2, p.224, 1973.
DOI : 10.1016/0021-9517(73)90226-1

J. Srolovitz and S. A. Safran, Capillary instabilities in thin films. I. Energetics, Journal of Applied Physics, vol.24, issue.1, p.247, 1986.
DOI : 10.1016/0040-6090(74)90172-2

C. V. Jiran and . Thompson, Capillary instabilities in thin films, Journal of Electronic Materials, vol.108, issue.11, p.1153, 1990.
DOI : 10.1007/BF02673327

E. Presland, G. L. Price, and D. L. Trimm, Kinetics of hillock and island formation during annealing of thin silver films, Progress in Surface Science, vol.3, p.63, 1973.
DOI : 10.1016/0079-6816(72)90006-8

L. Firebaugh, K. F. Jensen, and M. A. Schmidt, Investigation of high-temperature degradation of platinum thin films with an in situ resistance measurement apparatus, Journal of Microelectromechanical Systems, vol.7, issue.1, p.128, 1998.
DOI : 10.1109/84.661395

C. Kim, T. L. Alford, D. R. Allee, A. Phys, *. Lett et al., 0%A:B$%C1-,@:43"<<+4%, 0%.1+23043"+4%.1/40%*+,5"4#6,/*70$%8+/*,0%03%.-30, p.4287, 2002.

!. %e+, :7:/I%;*-9043-9%.:49%<0%,@, +49%;:*<-O%;:*% :2/9%.0%<:4#:#0O%.1/40%D*+,5"4#6,/*70%.0%(OPJQD$%