pour une abscisse x de la fibre (repérée par rapport au centre de la surface optique), correspond à la somme sur tout le volume d'intégration de l'intensité oIi, émise par chaque élément de volume oV ,
,(x) peut s'exprimer comme: avec: -a(u,yo) =0 pour u e: [-XO ,
,(x) est donc égale à l'intensité Ii.,(x,y) réelle émise par les éléments de volume oV(x,y) compris dans le volume d'intégration et "modulée ,
les profils expérimentaux peuvent être fortement différents des profils réels. La figure B-4 représente schématiquement l'influence de la fonction de transfert sur des profils réels dans le cas d'une fonction de transfert en créneau (physiquement, ce cas correspondrait à un système optique ayant un volume d'intégration de section constante suivant la distance à la surface optique, REFERENCES BIBLIOGRAPHIQUES, 1985. ,
Neutral and negative ion cluster emission during sputtering, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol.62, issue.1, p.43, 1991. ,
DOI : 10.1016/0168-583X(91)95925-4
Sputtering by particle Bombardment of solid 1, 1981. ,
Predicting thin???film stoichiometry in reactive sputtering, Journal of Applied Physics, vol.40, issue.3, p.887, 1988. ,
DOI : 10.1016/0040-6090(84)90201-3
Sputtering by Particule Bombardement II, 1983. ,
Attempted modelling of thickness and chemical heterogeneity in coatings prepared by d.c. reactive magnetron sputtering, Surface and Coatings Technology, vol.59, issue.1-3, p.41, 1993. ,
DOI : 10.1016/0257-8972(93)90052-P
Effects of hydrogen on iron nitriding in a pulsed plasma, Journal of Physics D: Applied Physics, vol.24, issue.7, p.1076, 1992. ,
DOI : 10.1088/0022-3727/24/7/007
Preliminary Studies of Analytical Applications of a Novel Magnetron Glow Discharge Plasma, Applied Spectroscopy, vol.32, issue.8, p.1327, 1991. ,
DOI : 10.1021/ac00168a026
SEAH (éditeurs)Practical Surface analysis, NELSON Chem. Phys. Letters, vol.2, issue.194, p.187, 1992. ,
Ions bombardement of solids, Heimann educational books Ltd, 1968. ,
Glow discharge processes, 1980. ,
Plasma diagnostic techniques" éd. Huddlestone et Leonard, 1965. ,
Introduction ta Plasma Physics and controlled fusion, 1994. ,
DOI : 10.1007/978-3-319-22309-4
New findings on the sputtering of neutral metal clusters, Surface Science, vol.298, issue.1, p.161, 1993. ,
DOI : 10.1016/0039-6028(93)90092-X
Dynamics of the reactions of aluminium atoms studied with pulsed crossed supersonic molecular beams, Faraday Discussions of the Chemical Society, vol.84, p.75, 1987. ,
DOI : 10.1039/dc9878400075
: Product state distribution, dissociation energy, and radiative lifetime, The Journal of Chemical Physics, vol.55, issue.5, p.1824, 1975. ,
DOI : 10.1063/1.1726760
Dielectric impurities and surface instability in Langmuir probe plasma measurements, Journal of Physics D: Applied Physics, vol.7, issue.10, p.1391, 1974. ,
DOI : 10.1088/0022-3727/7/10/312
Evolution thermique d'une sonde ??lectrostatique dans un gaz rar??fi?? et partiellement ionis??, International Journal of Heat and Mass Transfer, vol.30, issue.3, p.551, 1987. ,
DOI : 10.1016/0017-9310(87)90269-9
reaction near 1400 K, The Journal of Chemical Physics, vol.1, issue.5, p.1977, 1976. ,
DOI : 10.1063/1.430710
Radiation Effects on Solid Surfaces, Adv. in Chem., Series, vol.158, issue.30, 1976. ,
HTFFR kinetics studies of the Al/SO2 reaction from 700 to 1600 K. Implications for D(Al???O), The Journal of Chemical Physics, vol.173, issue.12, p.4854, 1979. ,
DOI : 10.1126/science.173.3996.517
Interaction plasma -surface", Réactivité dans les plasmas , applic ations aux lasers et au traitement de surface, Ecole d'été d'Aussois, 1983. ,
Abnormally low electron energy and heating-mode transition in a low-pressure argon rf discharge at 13.56 MHz, Physical Review Letters, vol.52, issue.8, p.996, 1990. ,
DOI : 10.1063/1.99283
D.C. cathode sputtering: influence of the oxygen content in the gas flow on the discharge current, Thin Solid Films, vol.33, issue.2, p.173, 1976. ,
DOI : 10.1016/0040-6090(76)90078-X
Plasma diagnostics" ; Mc Graw et Hill, 1964. ,
Effects of monolayer coverages on substrate sputtering yields, Radiation Effects, vol.95, issue.1-2, p.113, 1985. ,
DOI : 10.1016/0039-6028(80)90189-2
Auger Ejection of Electrons from Tungsten by Noble Gas Ions, Physical Review, vol.89, issue.2, p.325, 1954. ,
DOI : 10.1103/PhysRev.89.244
Effect of Monolayer Adsorption on the Ejection of Electrons from Metals by Ions, Physical Review, vol.91, issue.6, p.1516, 1956. ,
DOI : 10.1103/PhysRev.91.543
Behavior of atomic and molecular sputtered particles during rf sputtering in Ar???O2 atmospheres, Journal of Non-Crystalline Solids, vol.124, issue.2-3, p.258, 1990. ,
DOI : 10.1016/0022-3093(90)90271-M
??tude exp??rimentale de la pulv??risation cathodique r??active du cobalt, Thin Solid Films, vol.42, issue.1, p.97, 1977. ,
DOI : 10.1016/0040-6090(77)90082-7
Principles of plasma diagnostics, 1987. ,
DOI : 10.1017/CBO9780511613630
Particulates in aluminum sputtering discharges, Journal of Applied Physics, vol.6, issue.10, p.6490, 1990. ,
DOI : 10.1063/1.341948
), The Journal of Chemical Physics, vol.12, issue.1, p.663, 1972. ,
DOI : 10.1016/S0010-2180(70)80052-9
Hysteresis effect in reactive sputtering: a problem of system stability, Journal of Physics D: Applied Physics, vol.19, issue.9, pp.187-729, 1986. ,
DOI : 10.1088/0022-3727/19/9/004
Temporal signal profiles of analytical species in modulated glow discharge plasmas, Analytical Chemistry, vol.65, issue.6, p.735, 1993. ,
DOI : 10.1021/ac00054a014
Factors influencing ion signal profiles in pulsed glow discharge mass spectrometry, Analytical Chemistry, vol.63, issue.22, p.2571, 1991. ,
DOI : 10.1021/ac00022a007
Shape of cathode dark space of a sputtering plasma determined from probe measurements, Journal of Applied Physics, vol.44, issue.5, p.2153, 1973. ,
DOI : 10.1063/1.1659435
Secondary-Electron Emission from Molybdenum Due to Positive and Negative Ions of Atmospheric Gases, Physical Review, vol.3, issue.4A, p.1407, 1965. ,
DOI : 10.1063/1.1703233
Thin Solid Films 193, pp.13-2795, 1990. ,
The effect of reagent translation on product internal energy distributions: Laser fluorescence study of Al+O2, The Journal of Chemical Physics, vol.67, issue.9, p.3854, 1977. ,
DOI : 10.1063/1.435420
Interaction plasma -surface, 1983. ,
Ionization cross sections for electrons (100???600 eV) in noble and diatomic gases, Physica, vol.32, issue.4, p.734, 1996. ,
DOI : 10.1016/0031-8914(66)90005-X
Spatially resolved optical emission studies of fluorocarbon RF plasma through the use of UV-transmitting optical fibers, Plasma Chemistry and Plasma Processing, vol.15, issue.2, p.183, 1985. ,
DOI : 10.1007/BF00566214
Films Prepared by Reactive Sputtering in Hydrogen-, Oxygen- and Nitrogen-Argon Mixtures, Japanese Journal of Applied Physics, vol.33, issue.Part 1, No. 7B, p.4465, 1994. ,
DOI : 10.1143/JJAP.33.4465
Three-Dimensional Simulation of Target Erosion in DC Magnetron Sputtering, Japanese Journal of Applied Physics, vol.33, issue.Part 1, No. 7B, p.4281, 1994. ,
DOI : 10.1143/JJAP.33.4281
The Application of Langmuir Probes to the Measurements in Flowing Afterglow Plasma, Contributions to Plasma Physics, vol.33, issue.2, p.185, 1990. ,
DOI : 10.1002/ctpp.2150300203
Inelastic Ion-Surface Collisions, 1977. ,
Pressure stability in reactive magnetron sputtering, Thin Solid Films, vol.158, issue.1, p.141, 1988. ,
DOI : 10.1016/0040-6090(88)90310-0
Les couches minces, suppl, p.183, 1992. ,
Décembre 1993) Etats Unis n?, pp.93-403153, 1993. ,
Electric probes for plasm a diagnostics, Thin Solid Film, vol.7, issue.1, p.liiffe books, 1971. ,
Surface contamination of active electrodes in plasmas: Distortion of conventional Langmuir probe measurements, Journal of Applied Physics, vol.37, issue.12, p.5134, 1975. ,
DOI : 10.1063/1.1708067
Pulse Technique for Probe Measurements in Gas Discharges, Journal of Applied Physics, vol.64, issue.9, p.1404, 1959. ,
DOI : 10.1063/1.1722238
A New Method for Estimating the Voltage-Current Characteristics in a Plasma-Dielectric-Metal System, Japanese Journal of Applied Physics, vol.21, issue.Part 2, No. 10, p.610, 1982. ,
DOI : 10.1143/JJAP.21.L610