Degradation of 4-Chlorobenzoic Acid in a Thin Falling Film Dielectric Barrier Discharge Reactor - Université de Lorraine Access content directly
Journal Articles Industrial and engineering chemistry research Year : 2014

Degradation of 4-Chlorobenzoic Acid in a Thin Falling Film Dielectric Barrier Discharge Reactor

Abstract

The degradation of 4-chlorobenzoic acid (4-CBA) in water was performed using an innovative plasma dielectric barrier discharge (DBD) process. The influence of the electrode material directly in contact with the solution was examined. The roles of power and frequency discharge on the treatment efficiency were also evaluated. The hydrodynamic behavior of the solution and physical aspect of the discharge were studied by contact angle measurements and intensified charge-coupled device (iCCD) acquisition, respectively. Analyses showed that the use of stainless steel (SS) resulted in a better efficiency of the process compared with the use of brass (B). The degradation of 4-CBA was 80 and 50% for SS and B, respectively, after 1 h of plasma discharge. The presence of NOx in the plasma discharge and corrosion reaction occurring on the brass surface limited the degradation of the 4-CBA. It was possible to observe two main byproducts and identify the 4-chlorosalicylic acid or 4-chlorohydroxybenzoic acid. Ultimately, the discharge frequency was reduced to limit the production of NOx species.
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Dates and versions

hal-01275424 , version 1 (17-02-2016)

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Olivier Lesage, Thibault Roques-Carmes, Jean-Marc Commenge, Xavier Duten, Michael Tatoulian, et al.. Degradation of 4-Chlorobenzoic Acid in a Thin Falling Film Dielectric Barrier Discharge Reactor. Industrial and engineering chemistry research, 2014, 53 (25), pp.10387-10396. ⟨10.1021/ie403772t⟩. ⟨hal-01275424⟩
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