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Note: Mechanical etching of atomic force microscope tip and microsphere attachment for thermal radiation scattering enhancement

Abstract : This Note describes a mechanical etching technique which can be used to prepare silicon tips used in atomic force microscopy apparatus. For such devices, dedicated tips with specific shapes are now commonly used to probe surfaces. Yet, the control of the tip morphology where characteristic scales are lower than 1 ֭ remains a real challenge. Here, we detail a controlled etching process of AFM probes apex allowing micrometer-sized sphere attachment. The technique used and influent parameters are discussed and SEM images of the achieved tips are given. Deceptive problems and drawbacks that might occur during the process are also covered.
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https://hal.univ-lorraine.fr/hal-01430693
Contributor : Lemta Ul <>
Submitted on : Tuesday, January 10, 2017 - 10:47:02 AM
Last modification on : Monday, March 29, 2021 - 4:03:05 PM

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Damien Brissinger, Gilles Parent, David Lacroix. Note: Mechanical etching of atomic force microscope tip and microsphere attachment for thermal radiation scattering enhancement. Review of Scientific Instruments, American Institute of Physics, 2013, 84 (12), pp.126106. ⟨10.1063/1.4849575⟩. ⟨hal-01430693⟩

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