Note: Mechanical etching of atomic force microscope tip and microsphere attachment for thermal radiation scattering enhancement

Abstract : This Note describes a mechanical etching technique which can be used to prepare silicon tips used in atomic force microscopy apparatus. For such devices, dedicated tips with specific shapes are now commonly used to probe surfaces. Yet, the control of the tip morphology where characteristic scales are lower than 1 ֭ remains a real challenge. Here, we detail a controlled etching process of AFM probes apex allowing micrometer-sized sphere attachment. The technique used and influent parameters are discussed and SEM images of the achieved tips are given. Deceptive problems and drawbacks that might occur during the process are also covered.
Type de document :
Article dans une revue
Review of Scientific Instruments, American Institute of Physics, 2013, 84 (12), pp.126106. 〈10.1063/1.4849575〉
Liste complète des métadonnées

https://hal.univ-lorraine.fr/hal-01430693
Contributeur : Lemta Ul <>
Soumis le : mardi 10 janvier 2017 - 10:47:02
Dernière modification le : lundi 22 janvier 2018 - 09:20:02

Identifiants

Collections

Citation

Damien Brissinger, Gilles Parent, David Lacroix. Note: Mechanical etching of atomic force microscope tip and microsphere attachment for thermal radiation scattering enhancement. Review of Scientific Instruments, American Institute of Physics, 2013, 84 (12), pp.126106. 〈10.1063/1.4849575〉. 〈hal-01430693〉

Partager

Métriques

Consultations de la notice

41