Ordered mesoporous silica films with pores oriented perpendicular to a titanium nitride substrate - Université de Lorraine Accéder directement au contenu
Article Dans Une Revue Physical Chemistry Chemical Physics Année : 2015

Ordered mesoporous silica films with pores oriented perpendicular to a titanium nitride substrate

Résumé

The production of thin mesoporous silica films with small (similar to 2-3 nm) pores oriented perpendicular to a titanium nitride growth surface is demonstrated using two methods. These are the growth from a Stober silica solution with surfactant ordering at the surface of the electrode, and electrochemically assisted growth from an acidic sol achieved by polarisation of the electrode surface. The thickness, pore order and pore size that can be achieved with these two methods is contrasted. A number of methods to vary the pore size by using different surfactants and swelling agents are explored. The advantage of applying these growth methods on titanium nitride surfaces is that it provides access to a wider electrochemical window for nanowire growth and sensor applications with non-aqueous electrolytes whilst retaining good film growth and adhesion properties.

Dates et versions

hal-01505370 , version 1 (11-04-2017)

Identifiants

Citer

Calum Robertson, Richard Beanland, Stuart A. Boden, Andrew L. Hector, Reza J. Kashtiban, et al.. Ordered mesoporous silica films with pores oriented perpendicular to a titanium nitride substrate. Physical Chemistry Chemical Physics, 2015, 17 (6), pp.4763-4770. ⟨10.1039/c4cp05730a⟩. ⟨hal-01505370⟩
51 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More