Optimization of the molecular sieving properties of amorphous SiCXNY:H hydrogen selective membranes prepared by PECVD

Abstract : In this work, low frequency PECVD a-SiCxNy:H thin films have been synthesized in the temperature range 25-300 A degrees C from hexamethyldisilazane precursor mixed with ammonia at various concentrations. A relevant correlation has been evidenced between the [N]/[C] atomic ratio in the gaseous phase and in the deposited thin films, allowing both prediction and control of the film microstructure. A simple method based on the analysis of the films FTIR spectra was proposed to determine the value of the [N]/[C] ratio and thus predict or adjust the gas transport properties of the membrane materials. Attractive ideal selectivities alpha*(He/N2) exceeding 90 with He permeance I (He) > 3.10(-7) mol.s(-1).m(-2).Pa-1 were measured at 150 A degrees C for the films prepared at 300 A degrees C with an optimum [N]/[C] atomic ratio in the range 0.1-1.5. These films behave as molecular sieve membranes with a thermally activated transport of helium.
Type de document :
Article dans une revue
European Physical Journal - Special Topics, EDP Sciences, 2015, 224 (9), pp.1935-1943. 〈10.1140/epjst/e2015-02511-y〉
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https://hal.univ-lorraine.fr/hal-01505372
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Soumis le : mardi 11 avril 2017 - 12:04:13
Dernière modification le : jeudi 11 octobre 2018 - 10:46:02

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M. Haacke, R. Coustel, V. Rouessac, M. Drobek, S. Roualdes, et al.. Optimization of the molecular sieving properties of amorphous SiCXNY:H hydrogen selective membranes prepared by PECVD. European Physical Journal - Special Topics, EDP Sciences, 2015, 224 (9), pp.1935-1943. 〈10.1140/epjst/e2015-02511-y〉. 〈hal-01505372〉

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