Solution precursor plasma spray process as an alternative rapid one-step route for the development of hierarchical ZnO films for improved photocatalytic degradation

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https://hal.univ-lorraine.fr/hal-02136139
Contributor : Raphaël Schneider <>
Submitted on : Tuesday, May 21, 2019 - 6:25:12 PM
Last modification on : Wednesday, May 22, 2019 - 1:29:02 AM

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Zexin Yu, Hatem Moussa, Meimei Liu, Raphaël Schneider, Michel Moliere, et al.. Solution precursor plasma spray process as an alternative rapid one-step route for the development of hierarchical ZnO films for improved photocatalytic degradation. Ceramics International, Elsevier, 2018, 44 (2), pp.2085-2092. ⟨10.1016/j.ceramint.2017.10.156⟩. ⟨hal-02136139⟩

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