Galvanostatic and potentiostatic deposition of bismuth telluride films from nitric acid solution: effect of chemical and electrochemical parameters - Archive ouverte HAL Access content directly
Journal Articles Journal of Crystal Growth Year : 2005

Galvanostatic and potentiostatic deposition of bismuth telluride films from nitric acid solution: effect of chemical and electrochemical parameters

S. Michel
  • Function : Author
N. Stein
  • Function : Author
J.M. Lecuire
  • Function : Author
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hal-03959334 , version 1 (27-01-2023)

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S. Michel, S. Diliberto, C. Boulanger, N. Stein, J.M. Lecuire. Galvanostatic and potentiostatic deposition of bismuth telluride films from nitric acid solution: effect of chemical and electrochemical parameters. Journal of Crystal Growth, 2005, 277 (1-4), pp.274-283. ⟨10.1016/j.jcrysgro.2004.12.164⟩. ⟨hal-03959334⟩
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