X-Ray photoelectron and Raman Studies of Microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films - Université de Lorraine Access content directly
Journal Articles Applied Surface Science Year : 2008

X-Ray photoelectron and Raman Studies of Microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films

Abstract

X-ray photoelectron and Raman spectroscopies were used to investigate the chemical and the structural properties of thin diamond films synthesised by Plasma Assisted Chemical Vapour Deposition (PACVD). This powerful combination expanded the chemical physics understanding of CVD diamond continuous films, during the first stages of growth that determine the global diamond film quality. Two peculiar properties were studied (i) the stress measurements were discussed by distinguishing clearly the chemical effects from the mechanical effects; (ii) an electronic gap at 2.7 eV probed by Raman resonance that corresponds to an energy loss peak on the XPS carbon signal, was related to the surface hydrogenation.
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hal-03982809 , version 1 (10-02-2023)

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Bernard Humbert, Nesrine Hellala, Jean Jacques Ehrhardt, Silvère Barrat, Elizabeth Bauer-Grosse. X-Ray photoelectron and Raman Studies of Microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films. Applied Surface Science, 2008, 254 (20), pp.6400-6409. ⟨10.1016/j.apsusc.2008.04.067⟩. ⟨hal-03982809⟩
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