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Étude de la magnétorésistance dans les alliages Fex SiO1-x et des multicouches discontinues FE/SiO

Abstract : Thin films of Fex(SiO)1-x alloys and Fe/SiO discontinuous multilayers were prepared by coevaporation of iron and silicon oxyde. The structure of the films was characterized with electron microscopy, X?ray diffraction and infrared absorption spectrometry. The magnetic properties were described from the hysteresis loops of the magnetization versus the applied magnetic field and from FC-ZFC curves. The properties of electronic transport were determined from magnetoresistance measurements. The alloys with 0,30°?°x°?°0,50 are superparamagnetic and a tunnel magnetoresistance is observed. Its value is equal to about 2°% near 100°K. For an iron thickness between 5 and 8°Å, the multilayers present a superparamagnetic behavior. The magnetoresistance, measured in the directions parallel and perpendicular to the films, remains less than 2°%.
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http://docnum.univ-lorraine.fr/prive/SCD_T_2001_0212_ANAS.pdf
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Submitted on : Thursday, March 29, 2018 - 10:39:05 AM
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Muhammad Anas. Étude de la magnétorésistance dans les alliages Fex SiO1-x et des multicouches discontinues FE/SiO. Autre [cond-mat.other]. Université Henri Poincaré - Nancy 1, 2001. Français. ⟨NNT : 2001NAN10212⟩. ⟨tel-01746498⟩

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