Skip to Main content Skip to Navigation
Theses

Modélisation et caractérisation expérimentale d'un procédé de dépôt de couches minces d'oxyde de silicium en plasma radiofréquence O2/HMDSO à basse pression

Abstract : The presented works deal with the investigation of a low pressure oxygen-hexamethyldisiloxane radio-frequency plasma assisting a chemical vapour deposition process used to deposit silicon oxide thin films onto metallic substrates. The first step consists in developing a fluid model to describe the plasma behaviour over a RF period. A particular attention is pa id to the time variation of the electric field and the charged particle densities. Moreover, the relative influence of the electrode ion bombardment and the wave-riding process on the secondary electron creation is pointed out and helps determine working conditions where ion impingement on the electrodes is reduced. ln a second step, the plasma is studied by means of optical emission spectroscopy and Fourier transform infra-red absorption spectroscopy (FTIR). From the experimental results, the dissociation rate of the organo-silicon monomer is estimated and valuable insights into the dissociation mechanisms of the organic precursor are obtained. FTIR analyses of the deposited films are carried out and coupled with the gas phase characterization, providing correlations between the film and the plasma compositions. These results are completed by a kinetic modelling of the neutral species in the 02/HMDSO plasma. This numerical simulation corn putes the variation of the main species density over the inter-electrode space and especially in the close vicinity of the substrate, allowing prediction of the carbon incorporation in the films.
Document type :
Theses
Complete list of metadata

https://hal.univ-lorraine.fr/tel-01749750
Contributor : Thèses Ul Connect in order to contact the contributor
Submitted on : Thursday, March 29, 2018 - 12:25:58 PM
Last modification on : Wednesday, March 24, 2021 - 10:24:03 AM
Long-term archiving on: : Friday, September 14, 2018 - 2:50:15 PM

File

INPL_T_2004_GOUJON_M.pdf
Files produced by the author(s)

Identifiers

  • HAL Id : tel-01749750, version 1

Collections

Citation

Marjorie Goujon. Modélisation et caractérisation expérimentale d'un procédé de dépôt de couches minces d'oxyde de silicium en plasma radiofréquence O2/HMDSO à basse pression. Sciences de la Terre. Institut National Polytechnique de Lorraine, 2004. Français. ⟨NNT : 2004INPL050N⟩. ⟨tel-01749750⟩

Share

Metrics

Record views

99

Files downloads

335