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Revêtements minces Zn-Si-O et Ti-Si-O : élaboration au moyen d'un procédé plasma hybride pulvérisation cathodique-PECVD et caractérisation

Abstract : The present work deals with the synthesis of Zn-Si-O and Ti-Si-O composite thin films by a hybrid process. The coatings are prepared by combining PECVD (Plasma Enhanced Chemical Vapour Deposition) of silicon oxide from hexamethyldisiloxane (HMDSO-Si2C6H180) and reactive sputtering of a zinc or a titanium target. Any composition of the deposited layer can be obtained from zinc oxide or titanium oxide to silicon oxide, by controlling the HMDSO flow rate in the reactor. The morphologies evolve from columnar to dense by adding silicon in the coating. Moreover, a competitive deposition process takes place between PECVD and sputtering. The critical flow rates above which the PECVD silicon oxide deposition takes place on the substrate and on the target can be described from measurements of the thin film deposition rates as a function of the HMDSO flow rate. The coating caracterisations show that they are, near the coating-substrate interface, made of a mixture of non-stoechiometric oxides whose composition is different from a ZnO+SiO2 or a TiO2+SiO2 mixing. Titanium and silicon are in excess near the coating-substrate interface, respectively in the Ti-Si-O and Zn-Si-O thin films. Then the atomic concentrations of titanium and silicon progressively decrease when reaching the surface of the thin film. These behaviours are correlated with an increase of the temperature during the first phase of deposition that increases the PECVD deposition kinetics and determines the contamination state of the target
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Alain Daniel. Revêtements minces Zn-Si-O et Ti-Si-O : élaboration au moyen d'un procédé plasma hybride pulvérisation cathodique-PECVD et caractérisation. Autre. Institut National Polytechnique de Lorraine, 2006. Français. ⟨NNT : 2006INPL087N⟩. ⟨tel-01752779⟩

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