Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses - Université de Lorraine
Journal Articles Journal of Materials Science: Materials in Electronics Year : 2019

Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

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Material chemistry

Raphaël Schneider  : Connect in order to contact the contributor

https://hal.univ-lorraine.fr/hal-02939434

Submitted on : Tuesday, September 15, 2020-3:47:57 PM

Last modification on : Tuesday, September 12, 2023-10:22:03 AM

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hal-02939434 , version 1 (15-09-2020)

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Faycal Chandoul, Hatem Moussa, Karima Jouini, Abdelwaheb Boukhachem, Faouzi Hosni, et al.. Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses. Journal of Materials Science: Materials in Electronics, 2019, 30 (1), pp.348-358. ⟨10.1007/s10854-018-0299-z⟩. ⟨hal-02939434⟩

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