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Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

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https://hal.univ-lorraine.fr/hal-02939434
Contributor : Raphaël Schneider <>
Submitted on : Tuesday, September 15, 2020 - 3:47:57 PM
Last modification on : Monday, March 29, 2021 - 4:07:32 PM

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Faycal Chandoul, Hatem Moussa, Karima Jouini, Abdelwaheb Boukhachem, Faouzi Hosni, et al.. Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses. Journal of Materials Science: Materials in Electronics, Springer Verlag, 2019, 30 (1), pp.348-358. ⟨10.1007/s10854-018-0299-z⟩. ⟨hal-02939434⟩

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