Silicon substrate preparation for epitaxial diamond crystals - Université de Lorraine Accéder directement au contenu
Article Dans Une Revue Diamond and Related Materials Année : 2001

Silicon substrate preparation for epitaxial diamond crystals

Résumé

Using the microwave plasma-assisted chemical-vapour deposition technique (MPCVD), we study the role of the (100) silicon substrate preparation prior to the ultra short bias enhanced nucleation (USBEN) step via various pre-treatments. We study the effect of the silicon HF cleaning coupled with the hydrogen plasma exposure in order to determine the efficiency of these pre-treatments to eliminate the native oxide layer on the silicon surface prior to the bias step. We show that the residual oxygen content in the gas phase during the hydrogen plasma exposure can strongly affect the nucleation density because of the formation of an oxide layer which is detrimental for the synthesis of highly oriented diamond (HOD) films. Moreover, we study the effect of the carburation step, often used for the synthesis of HOD films and show that it raises the percentage of epitaxial crystals and the crystal density. Thus, we show that the achievement of high epitaxial crystal density is not only due to the BEN parameters but also to the silicon substrate preparation. As a conclusion, it appears that the silicon substrate preparation prior to BEN is fundamental for controlling the quality of epitaxial diamond films.

Domaines

Chimie
Fichier principal
Vignette du fichier
ARTICLE1.pdf (345.29 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Licence : CC BY NC ND - Paternité - Pas d'utilisation commerciale - Pas de modification

Dates et versions

hal-03978891 , version 1 (10-02-2023)

Licence

Paternité - Pas d'utilisation commerciale - Pas de modification

Identifiants

Citer

S. Saada, S. Barrat, E. Bauer-Grosse. Silicon substrate preparation for epitaxial diamond crystals. Diamond and Related Materials, 2001, 10 (3-7), pp.300-305. ⟨10.1016/S0925-9635(00)00570-7⟩. ⟨hal-03978891⟩
7 Consultations
18 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More