Etude de l'évolution de la texture cristallographique des couches minces de cuivre et de tellurure de bismuth en fonction des conditions d'électrodéposition

Abstract : This study presents the evolution of the cristallographic texture of thin layers according to the electrodeposition conditions of two very different material : copper and bismuth telluride. Texture of copper according to the thickness and the current density show that the layer is isotropic at the beginning of the electrodeposition. When the thickness of the deposit increases, several [uuw] fiber textures appear. After some micrometers, only two main orientations subsist <111> and/or <100>. The <111> fiber orientation comes from orientations for which w>u, while <100> orientation appears if u>w. During the deposition, we have studied the texture of Bi2Te3 according to : the nature of the substrat, the current density, the electrolyte concentration and the stoechiometrie. Electrodeposition conditions able to give fiber textures as <11.0> and <10.0>, leading to the C axis parallel to the surface of the layer, are defined. These orientation could give layers having good electrical properties. We have been able to put in obviousness, with the help of Hartman theory, a correlation between the preferential orientation and the morphology of crystals. This work shows the influence of some parameters on the texture of deposits and that it is possible to forecast orientations of the electrodeposited layers by using Hartman theory of crystal growth
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Hanane Chaouni Benabdallah. Etude de l'évolution de la texture cristallographique des couches minces de cuivre et de tellurure de bismuth en fonction des conditions d'électrodéposition. Autre. Université Paul Verlaine - Metz, 1995. Français. ⟨NNT : 1995METZ054S⟩. ⟨tel-01777103⟩

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