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Study of a pulsed post‐discharge plasma deposition process of APTES: synthesis of highly organic pp‐APTES thin films with NH 2 functionalized polysilsesquioxane evidences

Abstract : This article reports the use of pulsed remote Ar-O 2 microwave plasma assisted chemical vapor deposition with an −NH 2 containing organosilicon precursor ((3-Aminopropyl)triethoxysilane: APTES). It is shown that modifying the plasma pulses duration (t on) and the plasma off duration (t off) allows to finely tune the deposited layer composition. In addition, the results of this work demonstrate that an important film growth occurs during t off , which results in an increased −NH 2 density. Besides, high resolution MALDI-ORBITRAP Mass spectrometry analysis clearly points out that APTES oligomers up to eight base units, including silsesquioxanes (cages), and cyclosi-loxanes (rings) molecules with intact −NH 2 groups are embedded into the as grown pp-APTES thin film. K E Y W O R D S microwave discharges, plasma-enhanced chemical vapour deposition (PECVD), plasma polymerization, pulsed discharges, remote plasma processes,
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https://hal.univ-lorraine.fr/hal-02105341
Contributor : Thierry Belmonte <>
Submitted on : Friday, May 10, 2019 - 9:56:22 AM
Last modification on : Monday, April 6, 2020 - 2:44:05 PM

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Simon Bulou, Elodie Lecoq, François Loyer, Gilles Frache, Thierry Fouquet, et al.. Study of a pulsed post‐discharge plasma deposition process of APTES: synthesis of highly organic pp‐APTES thin films with NH 2 functionalized polysilsesquioxane evidences. Plasma Processes and Polymers, Wiley-VCH Verlag, 2019, 16 (4), pp.1800177. ⟨10.1002/ppap.201800177⟩. ⟨hal-02105341⟩

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