Natural oxidation of annealed chemically etched porous silicon - Université de Lorraine Access content directly
Journal Articles Thin Solid Films Year : 1995

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hal-02559902 , version 1 (30-04-2020)

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N.Hadj Zoubir, M. Vergnat, T. Delatour, A. Burneau, Ph. de Donato, et al.. Natural oxidation of annealed chemically etched porous silicon. Thin Solid Films, 1995, 255 (1-2), pp.228-230. ⟨10.1016/0040-6090(94)05659-2⟩. ⟨hal-02559902⟩
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