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Natural oxidation of annealed chemically etched porous silicon

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https://hal.univ-lorraine.fr/hal-02559902
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Submitted on : Thursday, April 30, 2020 - 6:48:54 PM
Last modification on : Friday, February 26, 2021 - 2:38:01 PM

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N.Hadj Zoubir, M. Vergnat, T. Delatour, A. Burneau, Ph. de Donato, et al.. Natural oxidation of annealed chemically etched porous silicon. Thin Solid Films, Elsevier, 1995, 255 (1-2), pp.228-230. ⟨10.1016/0040-6090(94)05659-2⟩. ⟨hal-02559902⟩

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