In situ control of AlCuFe thin film crystallization using optical pyrometry

N. Bonasso; C. Petitot; Didier Rouxel; P. Pigeat

doi:10.1016/j.tsf.2005.03.029

Journal Articles Thin Solid Films Year : 2005

In situ control of AlCuFe thin film crystallization using optical pyrometry

, , (1) ,

1

N. Bonasso

Function : Author
PersonId : 740973
IdHAL : nathalie-allain
ORCID : 0000-0003-4165-7941
IdRef : 074028626

C. Petitot

Function : Author

Didier Rouxel

Function : Author
PersonId : 12289
IdHAL : didier-rouxel
ORCID : 0000-0003-1935-2316
IdRef : 142411094

Institut Jean Lamour

CV

P. Pigeat

Function : Author

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Biomaterials Material chemistry Materials Science [cond-mat.mtrl-sci]

Didier ROUXEL : Connect in order to contact the contributor

https://hal.univ-lorraine.fr/hal-03030010

Submitted on : Sunday, November 29, 2020-5:53:54 PM

Last modification on : Thursday, April 11, 2024-1:08:13 PM

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hal-03030010 , version 1 (29-11-2020)

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HAL Id : hal-03030010 , version 1
DOI : 10.1016/j.tsf.2005.03.029

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N. Bonasso, C. Petitot, Didier Rouxel, P. Pigeat. In situ control of AlCuFe thin film crystallization using optical pyrometry. Thin Solid Films, 2005, 485 (1-2), pp.8-15. ⟨10.1016/j.tsf.2005.03.029⟩. ⟨hal-03030010⟩

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In situ control of AlCuFe thin film crystallization using optical pyrometry

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