Modelling microstructure formation in TiAl by isomorphic inoculation - Université de Lorraine
Proceedings/Recueil Des Communications IOP Conference Series: Materials Science and Engineering Année : 2023

Modelling microstructure formation in TiAl by isomorphic inoculation

J.R. Kennedy
A.K. Boukellal
M. Založnik
D. Daloz
  • Fonction : Auteur
Julien Zollinger

Résumé

Abstract Ti-Al alloys have replaced Ni-based superalloys in the last stages of some aircraft engines to improve fuel efficiency. In order to improve their properties, grain refinement has been investigated via isomorphic inoculation with Ti-Al-Nb particles. This inoculation method is orders of magnitude more efficient on a particle-by-particle basis than traditional inoculation, rather than multiple inoculant particles added to form a solidified bulk phase grain, in isomorphic inoculation each particle added results in the formation of multiple grains. As the particles are indistinguishable from the matrix after solidification, a model was used to elucidate this mechanism. Two phenomena were considered to calculate the number of particles acting during solidification: particle breakup along grain boundaries and complete particle dissolution. The grain size of the particles was calculated with an empirical model from initial TKD analysis of the particles and high temperature molten salt heat treatments. Particle dissolution was estimated via mass transport of the slowest diffusing Nb species. This showed the population of isomorphic inoculant particles which can act during solidification is near a 1:1 ratio with the number of grains formed, confirming the mechanism of grain refinement by direct epitaxial growth from the particles.

Dates et versions

hal-04213256 , version 1 (21-09-2023)

Identifiants

Citer

J.R. Kennedy, A.K. Boukellal, M. Založnik, D. Daloz, Julien Zollinger. Modelling microstructure formation in TiAl by isomorphic inoculation. IOP Conference Series: Materials Science and Engineering, 1281 (1), pp.012044, 2023, ⟨10.1088/1757-899X/1281/1/012044⟩. ⟨hal-04213256⟩
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