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Sticking and deposition of atoms in the sub-monolayer range

Abstract : During plasma assisted deposition, properties of the coating substrate interface depend on the first atomic layer of the deposit, or the atoms that first start to cover the surface. Therefore the good knowledge of the sticking coefficient and the reorganization of the surface following particle impact is an essential issue to achieve the description of the behavior of the processed surface and, therefore, its expected properties. Consequently, we investigated the interaction between incoming particles (C, Ti, W) and a silicon surface by using an approach combining molecular dynamic simulations and experiments. Various initial conditions were studied, energy, fluence and incidence angle of the incoming particles. An important part of this work has consisted in adapting the molecular dynamic codes (using reactive force fields) to the investigated systems. Meanwhile, experimental procedure specifically devoted to the use of the Storing Matter facility was also developed. Results show that the sticking coefficient (SC) value is in the range [0.7 – 1] irrespectively of the incoming species; in the case of W, almost all atoms stick on the surface (SC~~1). Besides the determination of sticking coefficient, the surface modification resulting from the particles impingement were determined for various initial conditions (energy, fluence, angle) in terms of implantation and displacement of the incoming species, and surface sputtering as well
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Submitted on : Thursday, March 29, 2018 - 12:55:07 PM
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  • HAL Id : tel-01750797, version 1


Arindam Jana. Sticking and deposition of atoms in the sub-monolayer range. Other. Université de Lorraine, 2014. English. ⟨NNT : 2014LORR0074⟩. ⟨tel-01750797⟩



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