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Synthèse et caractérisation de films minces de SiCₓNᵧ∶H par procédé CVD assisté par plasma ECR/Magnétron RF

Abstract : SiCN materials have very interesting properties that can be modulated by changing the chemical composition. The most remarkable are the mechanical properties (hardness, Yong module), optics (modulation of the Tauc gap and the optical index), passivation (high temperature oxidation resistance), waveguide, durability, etc. We have developed a new plasma-assisted vapour-phase chemical deposition process. This involves combining 2 types of plasma excitation. The first is excited at electronic cyclotronic resonance and the second is a RF magnetron plasma with a silicon target. The gas mixture used is Ar/N2/Tetramethylsilane. The control of the process is carried out by in-situ optical diagnostics in the visible by reflectometry and in the infrared by FTIR spectroscopy both in transmission and in reflection. The 2 coupling processes allow to obtain greater deposition growth rate (of the order of 1 µm/h) than in the conventional chemical vapour deposition process. In the dual ECR/Magnetron RF process with silicon target, we obtain a good modulation of the chemical composition with the autopolarization voltage of the silicon target. This is also accompanied by a good modulation of optical properties. The optical index varies linearly between 1.7 and 2.05 at 350nm and the Tauc gap decreases linearly between 5.2 and 3.4 eV. In the dual RF magnetron process with TMS, the deposition speed is doubled, and the resulting films are denser for large autopolarization voltages The optical index is between 1.85 and 1.95 at 350nm, the gap of Tauc is of the order of 3.0 eV.
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Submitted on : Monday, September 6, 2021 - 1:45:12 PM
Last modification on : Sunday, June 26, 2022 - 3:12:56 AM
Long-term archiving on: : Tuesday, December 7, 2021 - 6:45:48 PM


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  • HAL Id : tel-03335645, version 1


Ziad Al Hallak. Synthèse et caractérisation de films minces de SiCₓNᵧ∶H par procédé CVD assisté par plasma ECR/Magnétron RF. Physique [physics]. Université de Lorraine; Université libanaise, 2021. Français. ⟨NNT : 2021LORR0037⟩. ⟨tel-03335645⟩



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